发明授权
- 专利标题: Method for forming metal pattern by using metal nanocrystals
- 专利标题(中): 使用金属纳米晶体形成金属图案的方法
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申请号: US11117431申请日: 2005-04-29
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公开(公告)号: US07205096B2公开(公告)日: 2007-04-17
- 发明人: Jong Jin Park , Sang Yeol Kim , Tae Woo Lee , Lyong Sun Pu
- 申请人: Jong Jin Park , Sang Yeol Kim , Tae Woo Lee , Lyong Sun Pu
- 申请人地址: KR Suwon-Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-Gyeonggi-do
- 代理机构: Buchanan Ingersoll & Rooney PC
- 优先权: KR10-2004-0096321 20041123
- 主分类号: C23C18/30
- IPC分类号: C23C18/30
摘要:
Disclosed herein is a method for forming a metal pattern by using metal nanocrystals. The method comprises the steps of: (i) coating a photosensitive compound having a substituent, which is converted into a free carboxyl group by light exposure, on a substrate to form a photosensitive film; (ii) selectively exposing the photosensitive film to light in the presence of a photoacid generator to form a latent pattern for crystal growth having a free carboxyl group; and (iii) treating the latent pattern for crystal growth with a nanometallic solution in which metal nanocrystals can be formed to grow the metal nanocrystals on the latent pattern. According to the method, a metal wiring pattern can be formed in a cost-effective and relatively simple manner. Further, the metal pattern formed by the method can be useful in the manufacture of an electromagnetic interference filter for flat panel display devices or an electrode, and can thus be applied to devices, e.g., organic light-emitting devices (OLED) and organic thin-film transistors (OTFT).