发明授权
- 专利标题: Device transferring method
- 专利标题(中): 设备传送方式
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申请号: US11079815申请日: 2005-03-14
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公开(公告)号: US07205214B2公开(公告)日: 2007-04-17
- 发明人: Kunihiko Hayashi , Yoshiyuki Yanagisawa , Toshiaki Iwafuchi , Hisashi Ohba
- 申请人: Kunihiko Hayashi , Yoshiyuki Yanagisawa , Toshiaki Iwafuchi , Hisashi Ohba
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Bell, Boyd & Lloyd LLP
- 优先权: JPP2001-112401 20010411; JPP2001-169857 20010605; JPP2001-194890 20010627; WOPCT/JP02/03549 20020409
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method of selectively transferring devices arrayed on a first substrate to a second substrate on which an adhesive resin layer is previously formed is provided. The method includes steps of selectively heating the adhesive resin layer on the second substrate by laser irradiation from the back surface side of the second substrate, and curing the selectively heated portions of the adhesive resin layer, thereby adhesively bonding those to be transferred of the devices to the second substrate. At this time, portions, corresponding to the devices, of the adhesive layer are heated directly or indirectly via the devices or wiring portions by laser irradiation from the back surface side of the substrate. The heated portions of the adhesive resin layer selectively exhibit the adhesive forces. The heated portions of the adhesive layer are then cured, so that only the devices to be transferred are selectively transferred to the second substrate. As a result, only the devices to be transferred can be done so with certainty, efficiency, and accuracy without exerting adverse effect on other parts.
公开/授权文献
- US20050158896A1 Device transferring method 公开/授权日:2005-07-21
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