发明授权
- 专利标题： Electron beam apparatus and method for production of its specimen chamber
- 专利标题（中）： 电子束装置及其试样室的制造方法
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申请号： US11450382申请日： 2006-06-12
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公开(公告)号： US07205550B2公开(公告)日： 2007-04-17
- 发明人: Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
- 申请人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
- 申请人地址： JP Tokyo
- 专利权人： Hitachi High-Technologies Corporation
- 当前专利权人： Hitachi High-Technologies Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Dickstein Shapiro LLP
- 优先权： JP2003-1684 20030108
- 主分类号： H03M1/22
- IPC分类号： H03M1/22
摘要：
A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.
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