Electron Beam Apparatus and Method for Production of Its Specimen Chamber
    2.
    发明申请
    Electron Beam Apparatus and Method for Production of Its Specimen Chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号:US20080048118A1

    公开(公告)日:2008-02-28

    申请号:US11907375

    申请日:2007-10-11

    IPC分类号: G01N23/00

    摘要: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    摘要翻译: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室,其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金,镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Electron beam apparatus and method for production of its specimen chamber
    3.
    发明授权
    Electron beam apparatus and method for production of its specimen chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号:US07435958B2

    公开(公告)日:2008-10-14

    申请号:US11356438

    申请日:2006-02-17

    IPC分类号: H01J37/10

    摘要: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    摘要翻译: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室,其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金,镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Electron beam apparatus and method for production of its specimen chamber
    4.
    发明授权
    Electron beam apparatus and method for production of its specimen chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号:US07205550B2

    公开(公告)日:2007-04-17

    申请号:US11450382

    申请日:2006-06-12

    IPC分类号: H03M1/22

    摘要: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    摘要翻译: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室,其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金,镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Electron beam apparatus and method for production of its specimen chamber
    5.
    发明授权
    Electron beam apparatus and method for production of its specimen chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号:US07566892B2

    公开(公告)日:2009-07-28

    申请号:US11907375

    申请日:2007-10-11

    IPC分类号: G01N23/00

    摘要: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    摘要翻译: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室,其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金,镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Electron gun and charged particle beam device having an aperture with flare-suppressing coating
    8.
    发明授权
    Electron gun and charged particle beam device having an aperture with flare-suppressing coating 有权
    具有带阻燃涂层的孔的电子枪和带电粒子束装置

    公开(公告)号:US09293293B2

    公开(公告)日:2016-03-22

    申请号:US14240333

    申请日:2012-05-22

    IPC分类号: A61N5/00 H01J37/065

    摘要: The objective of the present application is to suppress the occurrence of flares and to reduce the amount of secondary electrons arising at an aperture provided to the lead-out electrode of an electron gun. By coating a thin film having a low rate of secondary electron emission such as carbon onto the aperture of a lead-out electrode closest to an electron source in an electron gun, it is possible to reduce the amount of secondary electrons arising. Secondary electrons arising at the lead-out electrode, are reduced, and so as a result, flare is reduced. By incorporating two apertures to the lead-out electrode, and applying to the two apertures a potential that is equipotential to the lead-out electrode, it is possible to eliminate an electric field from seeping from under to over the lead-out electrode. Secondary electrons arising when an electron beam impacts the lead-out electrode cease to incur force in the direction of passage from the lead-out electrode, and consequently there is a reduction in flares.

    摘要翻译: 本申请的目的是抑制耀斑的发生和减少在设置到电子枪的引出电极的孔处产生的二次电子的量。 通过在电子枪中最接近电子源的引出电极的孔径上涂布碳二次电子发射率低的薄膜,可以减少二次电子的产生量。 在引出电极处产生的二次电子减少,结果是减少了耀斑。 通过在引出电极上并入两个孔,并且向两个孔施加与引出电极等电位的电位,可以消除从下面到引出电极渗出的电场。 当电子束撞击引出电极时产生的二次电子停止从引出电极通过的方向上产生力,因此发光减少。

    ELECTRON GUN AND CHARGED PARTICLE BEAM DEVICE
    9.
    发明申请
    ELECTRON GUN AND CHARGED PARTICLE BEAM DEVICE 有权
    电子枪和充电颗粒光束装置

    公开(公告)号:US20140197336A1

    公开(公告)日:2014-07-17

    申请号:US14240333

    申请日:2012-05-22

    IPC分类号: H01J37/065

    摘要: The objective of the present application is to suppress the occurrence of flares and to reduce the amount of secondary electrons arising at an aperture provided to the lead-out electrode of an electron gun. By coating a thin film having a low rate of secondary electron emission such as carbon onto the aperture of a lead-out electrode closest to an electron source in an electron gun, it is possible to reduce the amount of secondary electrons arising. Secondary electrons arising at the lead-out electrode, are reduced, and so as a result, flare is reduced. By incorporating two apertures to the lead-out electrode, and applying to the two apertures a potential that is equipotential to the lead-out electrode, it is possible to eliminate an electric field from seeping from under to over the lead-out electrode. Secondary electrons arising when an electron beam impacts the lead-out electrode cease to incur force in the direction of passage from the lead-out electrode, and consequently there is a reduction in flares.

    摘要翻译: 本申请的目的是抑制耀斑的发生和减少在设置到电子枪的引出电极的孔处产生的二次电子的量。 通过在电子枪中最接近电子源的引出电极的孔径上涂布碳二次电子发射率低的薄膜,可以减少二次电子的产生量。 在引出电极处产生的二次电子减少,结果是减少了耀斑。 通过在引出电极上并入两个孔,并且向两个孔施加与引出电极等电位的电位,可以消除从下面到引出电极渗出的电场。 当电子束撞击引出电极时产生的二次电子停止从引出电极通过的方向上产生力,因此发光减少。

    DEVICE FOR CORRECTING DIFFRACTION ABERRATION OF ELECTRON BEAM
    10.
    发明申请
    DEVICE FOR CORRECTING DIFFRACTION ABERRATION OF ELECTRON BEAM 有权
    用于校正电子束的衍射脱落的装置

    公开(公告)号:US20140124664A1

    公开(公告)日:2014-05-08

    申请号:US13977139

    申请日:2011-12-26

    摘要: A diffraction aberration corrector formed by the multipole of the solenoid coil ring and having a function of adjusting the degree of orthogonality or axial shift of the vector potential with respect to the beam axis. In order to cause a phase difference, the diffraction aberration corrector that induces a vector potential, which is perpendicular to the beam axis and has a symmetrical distribution within the orthogonal plane with respect to the beam axis, is provided near the objective aperture and the objective lens. A diffracted wave traveling in a state of being inclined from the beam axis passes through the ring of the magnetic flux. Since the phase difference within the beam diameter is increased by the Aharonov-Bohm effect due to the vector potential, the intensity of the electron beam on the sample is suppressed.

    摘要翻译: 由电磁线圈环的多极形成的衍射像差校正器,具有调整矢量电势相对于光束轴线的正交性或轴向移动的功能的功能。 为了产生相位差,在物镜孔附近设置衍射像差校正器,该衍射像差校正器垂直于光束轴并且在相对于光束轴线的正交平面内具有对称分布的矢量电位, 镜片。 在从光束轴倾斜的状态下行进的衍射波通过磁通的环。 由于由于向量电位而使光束直径内的相位差增加了Aharonov-Bohm效应,所以抑制了样品上电子束的强度。