发明授权
- 专利标题： Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object
- 专利标题（中）： 电子束照射装置，电子束照射方法及其制造方法及其制造方法
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申请号： US11335950申请日： 2006-01-20
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公开(公告)号： US07205558B2公开(公告)日： 2007-04-17
- 发明人: Kenji Yoneyama , Kazushi Tanaka , Mamoru Usami
- 申请人： Kenji Yoneyama , Kazushi Tanaka , Mamoru Usami
- 申请人地址： JP Tokyo
- 专利权人： TDK Corporation
- 当前专利权人： TDK Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Darby & Darby
- 优先权： JP2004-019681 20040128
- 主分类号： G21K5/10
- IPC分类号： G21K5/10
摘要：
Disclosed are an electron beam irradiation apparatus and an electron beam irradiation method that are capable of easily curing a material that is hard to be cured by irradiation of ultraviolet rays and of reducing the number of electron beam irradiation tubes. The electron beam irradiation apparatus has a motor for rotationally driving an irradiation target object, a shield container for rotatably accommodating the irradiation target object, and an electron beam irradiation unit provided in the shield container so that the surface of the irradiation target object is irradiated with electron beams, wherein the electron beam irradiation unit and the irradiation target object are relatively moved when the electron beam irradiation unit irradiates the surface of the irradiation target object with the electron beams during a rotation of the irradiation target object.
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