发明授权
US07209292B2 Projection objective, especially for microlithography, and method for adjusting a projection objective 有权
投影目标,特别是微光刻法,以及调整投影物镜的方法

Projection objective, especially for microlithography, and method for adjusting a projection objective
摘要:
A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.
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