公开(公告)号：US07310187B2

公开(公告)日：2007-12-18

申请号：US11783966

申请日：2007-04-13

申请人： Alexander Epple ,  Paul Graeupner ,  Winfried Kaiser ,  Reiner Garreis ,  Wilhelm Ulrich

发明人： Alexander Epple ,  Paul Graeupner ,  Winfried Kaiser ,  Reiner Garreis ,  Wilhelm Ulrich

IPC分类号： G02B3/00 ,  G02B15/02

CPC分类号： G03F7/70308 ,  G03F7/70258 ,  G03F7/70341

摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature. The method comprises varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and preferably axial displacement of the last optical element in order to set a suitable working distance.

公开(公告)号：US07209292B2

公开(公告)日：2007-04-24

申请号：US10448339

申请日：2003-05-30

申请人： Alexander Epple ,  Paul Graeupner ,  Winfried Kaiser ,  Reiner Garreis ,  Wilhelm Ulrich

发明人： Alexander Epple ,  Paul Graeupner ,  Winfried Kaiser ,  Reiner Garreis ,  Wilhelm Ulrich

IPC分类号： G02B3/00 ,  G02B15/02 ,  G02B27/02

CPC分类号： G03F7/70308 ,  G03F7/70258 ,  G03F7/70341

摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.

摘要翻译： 调整投影物镜的方法允许在浸入构型和干构型之间调节投影物镜。 投影物镜包括沿其光轴布置的光学元件，其包括在物平面之后的第一组元件和位于第一组之后的最后一个光学元件，其位于图像平面附近。 最后一个光学元件限定投影物镜的出射表面，该出射表面设置在距离像平面的工作距离处。 最后的光学元件基本上没有屈光力并且没有或仅有微小的曲率。 该方法包括通过引入或去除浸没介质来改变最后一个光学元件的厚度，改变出射表面和图像平面之间的空间的折射率，以及轴向移动最后一个光学元件以设定工作距离。

公开(公告)号：US20070188881A1

公开(公告)日：2007-08-16

申请号：US11783966

申请日：2007-04-13

申请人： Alexander Epple ,  Paul Graeupner ,  Winfried Kaiser ,  Reiner Garreis ,  Wilhelm Ulrich

发明人： Alexander Epple ,  Paul Graeupner ,  Winfried Kaiser ,  Reiner Garreis ,  Wilhelm Ulrich

IPC分类号： G02B3/00

CPC分类号： G03F7/70308 ,  G03F7/70258 ,  G03F7/70341

摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature. The method comprises varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and preferably axial displacement of the last optical element in order to set a suitable working distance.

摘要翻译： 调整投影物镜的方法允许投影物镜在浸没配置和干燥配置之间进行调节，而在系统中几乎没有干预，因此可任选地用作浸没物镜或干物镜。 投影物镜具有沿着投影物镜的光轴布置的多个光学元件，光学元件包括跟随物平面的第一组光学元件和紧邻第一组的最后一个光学元件，邻近于图像 并且限定投影物镜的离开像面的工作距离处的出射表面。 最后一个光学元件基本上没有屈光力并且没有曲率或仅有轻微的曲率。 该方法包括改变最后一个光学元件的厚度，通过引入或移除浸没介质来改变出射表面和图像平面之间的空间的折射率，优选地最后一个光学元件的轴向位移，以便设定合适的 工作距离

公开(公告)号：US06806942B2

公开(公告)日：2004-10-19

申请号：US10434952

申请日：2003-05-08

申请人： Karl-Heinz Schuster ,  Wilhelm Ulrich ,  Toralf Gruner ,  Daniel Kraehmer ,  Wolfgang Singer ,  Alexander Epple ,  Helmut Beierl ,  Reiner Garreis

发明人： Karl-Heinz Schuster ,  Wilhelm Ulrich ,  Toralf Gruner ,  Daniel Kraehmer ,  Wolfgang Singer ,  Alexander Epple ,  Helmut Beierl ,  Reiner Garreis

IPC分类号： G03B2754

CPC分类号： G03F7/70241 ,  G02B13/143 ,  G02B13/24

摘要： A projection exposure system is proposed which is positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width &dgr;&lgr; about a central working wavelength &lgr;, wherein a relative width &dgr;&lgr;/&lgr; of the wavelength band is larger than 0.002, in particular, larger than 0.005, for example, of the Hg-I-line. The projection exposure system is a so-called three-bulge system comprising three bulges having, as a whole, a positive refractive power and two waists having, as a whole, a negative refractive power. By applying suitable measures, in particular, by suitably selecting the material for the lenses forming the projection exposure system, the long-term stability of the system is increased.

摘要翻译： 提出了一种投影曝光系统，其可定位在第一物体和第二物体之间，用于在具有围绕中心工作波长λ的宽度偏差的波长带的光的第二物体的区域内成像第一物体，其中相对宽度 波长带的偏差λ/λ大于0.002，特别是大于0.005，例如Hg-I线。 投影曝光系统是所谓的三凸起系统，其包括总体上具有正屈光力的三个凸起，以及整体上具有负屈光力的两个凸起。 通过适当的措施，特别是通过适当选择形成投影曝光系统的透镜的材料，可以提高系统的长期稳定性。

公开(公告)号：US07126765B2

公开(公告)日：2006-10-24

申请号：US11029788

申请日：2005-01-05

申请人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

发明人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

IPC分类号： G02B17/00 ,  G02B13/14

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

公开(公告)号：US07180667B2

公开(公告)日：2007-02-20

申请号：US10817527

申请日：2004-04-01

申请人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

发明人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

IPC分类号： G02B5/30

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

公开(公告)号：US07382536B2

公开(公告)日：2008-06-03

申请号：US11392027

申请日：2006-03-29

申请人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

发明人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

IPC分类号： G02B5/30

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

公开(公告)号：US20050122594A1

公开(公告)日：2005-06-09

申请号：US11029788

申请日：2005-01-05

申请人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

发明人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

IPC分类号： G02B13/24 ,  G02B1/02 ,  G02B5/30 ,  G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B27/28

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

公开(公告)号：US20080151211A1

公开(公告)日：2008-06-26

申请号：US11951746

申请日：2007-12-06

申请人： Winfried Kaiser ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Aurelian Dodoc

发明人： Winfried Kaiser ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Aurelian Dodoc

IPC分类号： G03B27/72

CPC分类号： G03F7/70341 ,  G03F7/70066 ,  G03F7/7025

摘要： Projection exposure methods and systems for exposing substrates are disclosed. The methods and systems feature projection objectives capable of multiple exposure configurations having different image side numerical apertures and different image field sizes.

摘要翻译： 公开了用于曝光衬底的投影曝光方法和系统。 该方法和系统具有能够具有不同图像侧数值孔径和不同图像场尺寸的多种曝光配置的投影物镜。

公开(公告)号：US20060171020A1

公开(公告)日：2006-08-03

申请号：US11392027

申请日：2006-03-29

申请人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

发明人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

IPC分类号： G02B13/14 ,  G02B3/00

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。