发明授权
- 专利标题: Nitride semiconductor device
- 专利标题(中): 氮化物半导体器件
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申请号: US11026062申请日: 2005-01-03
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公开(公告)号: US07211822B2公开(公告)日: 2007-05-01
- 发明人: Shinichi Nagahama , Masayuki Senoh , Shuji Nakamura
- 申请人: Shinichi Nagahama , Masayuki Senoh , Shuji Nakamura
- 申请人地址: JP Anan-shi
- 专利权人: Nichia Chemical Industries, Ltd.
- 当前专利权人: Nichia Chemical Industries, Ltd.
- 当前专利权人地址: JP Anan-shi
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP9-001937 19970109; JP9-012707 19970127; JP9-102793 19970403; JP9-134210 19970526; JP9-244342 19970909; JP9-274438 19971007; JP9-311272 19971027
- 主分类号: H01L31/0304
- IPC分类号: H01L31/0304
摘要:
A nitride semiconductor device including a light emitting device comprises a n-type region of one or more nitride semiconductor layers having n-type conductivity, a p-type region of one or more nitride semiconductor layers having p-type conductivity and an active layer between the n-type region and the p-type region. In such devices, there is provided with a super lattice layer comprising first layers and second layers which are nitride semiconductors having a different composition respectively. The super lattice structure makes working current and voltage of the device lowered, resulting in realization of more efficient devices.
公开/授权文献
- US20050127394A1 Nitride semiconductor device 公开/授权日:2005-06-16
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