发明授权
US07214588B2 Methods of forming memory cells with nonuniform floating gate structures
有权
用不均匀的浮栅结构形成记忆单元的方法
- 专利标题: Methods of forming memory cells with nonuniform floating gate structures
- 专利标题(中): 用不均匀的浮栅结构形成记忆单元的方法
-
申请号: US11247814申请日: 2005-10-11
-
公开(公告)号: US07214588B2公开(公告)日: 2007-05-08
- 发明人: Jae-Duk Lee , Dong-gun Park , Jeong-Hyuk Choi
- 申请人: Jae-Duk Lee , Dong-gun Park , Jeong-Hyuk Choi
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec
- 优先权: KR2002-76956 20021205
- 主分类号: H01L21/336
- IPC分类号: H01L21/336 ; H01L29/76 ; H01L29/788
摘要:
In a floating gate memory cell including a floating gate separated from an active region by a tunnel isolation region, a first one of the active region and the floating gate comprises a portion that protrudes towards a second one of the active region and the floating gate. In some embodiments, the protruding portion tapers toward the second one of the active region and the floating gate. The tunnel insulation layer may be narrowed at the protruding portion. Protruding portions may be formed on both the floating gate and the active region.
公开/授权文献
信息查询
IPC分类: