发明授权
- 专利标题: Method of writing to MRAM devices
- 专利标题(中): 写入MRAM设备的方法
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申请号: US11097495申请日: 2005-04-01
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公开(公告)号: US07218556B2公开(公告)日: 2007-05-15
- 发明人: Hyun-Jo Kim , Jang-Eun Lee , Se-Chung Oh , Jun-Soo Bae , Young-Ki Ha , Kyung-Tae Nam
- 申请人: Hyun-Jo Kim , Jang-Eun Lee , Se-Chung Oh , Jun-Soo Bae , Young-Ki Ha , Kyung-Tae Nam
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Mills & Onello LLP
- 优先权: KR10-2004-0065609 20040819
- 主分类号: G11C11/00
- IPC分类号: G11C11/00
摘要:
A method of writing to magnetic random access memory (MRAM) devices is provided. The method includes preparing a digit line disposed on a semiconductor substrate, a bit line crossing over the digit line, and a magnetic tunnel junction (MTJ) interposed between the digit line and the bit line. The MTJ has a pinned layer, a tunneling insulating layer, and a synthetic anti-ferromagnetic (SAF) free layer which are sequentially stacked. In addition, the SAF free layer has a bottom free layer and a top free layer which are separated by an exchange spacer layer. An initial magnetization state of the MTJ is read and compared with a desired magnetization state. When the initial magnetization state is different from the desired magnetization state, a first write line pulse is applied to one of the digit line and the bit line, and a second write line pulse is applied to the other of the digit line and the bit line, thereby changing the magnetization state of the MTJ. The MTJ may be disposed at an angle equal to or greater than 0° and less than 90° to a line to which the second write line pulse is applied.
公开/授权文献
- US20060039190A1 Method of writing to MRAM devices 公开/授权日:2006-02-23