发明授权
- 专利标题: Imageable members with improved chemical resistance
- 专利标题(中): 具有改善耐化学性的可成像构件
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申请号: US11393156申请日: 2006-03-30
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公开(公告)号: US07223506B1公开(公告)日: 2007-05-29
- 发明人: Anthony P. Kitson , Shashikant Saraiya , Kevin B. Ray , James L. Mulligan , Frederic E. Mikell , Larisa Novoselova , Eric Clark
- 申请人: Anthony P. Kitson , Shashikant Saraiya , Kevin B. Ray , James L. Mulligan , Frederic E. Mikell , Larisa Novoselova , Eric Clark
- 申请人地址: US NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: US NY Rochester
- 代理商 J. Lanny Tucker
- 主分类号: G03F7/038
- IPC分类号: G03F7/038 ; G03F7/039 ; G03F7/14
摘要:
Single-layer and multilayer imageable elements have a substrate and at least one imageable layer and can be used to prepare positive-working lithographic printing plates. The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer binder comprising an —N(R)—C(═X)—N(R′)—S(═O)2— moiety that is attached to the polymer backbone, wherein X is O or S, R and R′ are independently hydrogen, halo, or an alkyl group having 1 to 6 carbon atoms. This solvent-resistant polymer binder is located in the imageable layer closest to the substrate and provides improved chemical resistance.
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