Invention Grant
- Patent Title: Electron source manufacturing apparatus and electron source manufacturing method
- Patent Title (中): 电子源制造装置和电子源制造方法
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Application No.: US10957839Application Date: 2004-10-05
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Publication No.: US07226331B2Publication Date: 2007-06-05
- Inventor: Shigeto Kamata , Kazuhiro Oki , Akihiro Kimura , Kazumasa Takatsu
- Applicant: Shigeto Kamata , Kazuhiro Oki , Akihiro Kimura , Kazumasa Takatsu
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2003-348394 20031007
- Main IPC: H01J9/00
- IPC: H01J9/00 ; H01J9/42
Abstract:
In an electron source manufacturing apparatus, the quantity of heat generated from an electron source substrate is measured. A temperature of a support member for the electron source substrate is controlled based on the measured quantity of heat generated. A variation in performances of electron source substrates is suppressed, which increase their life.
Public/Granted literature
- US20050075031A1 Electron source manufacturing apparatus and electron source manufacturing method Public/Granted day:2005-04-07
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