发明授权
- 专利标题: Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting
- 专利标题(中): 抛光垫,压板,监测方法,制造方法和检测方法
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申请号: US10726637申请日: 2003-12-04
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公开(公告)号: US07229337B2公开(公告)日: 2007-06-12
- 发明人: Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
- 申请人: Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2003-0038740 20030616
- 主分类号: B24B19/00
- IPC分类号: B24B19/00
摘要:
A polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting using a pseudo window area, where the pseudo window area has a thickness less than a thickness of a polishing layer and a thickness greater than zero.