Invention Grant
- Patent Title: Method and apparatus for measuring three-dimensional shape of specimen by using SEM
- Patent Title (中): 用SEM测量样品三维形状的方法和装置
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Application No.: US11156478Application Date: 2005-06-21
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Publication No.: US07230243B2Publication Date: 2007-06-12
- Inventor: Maki Tanaka , Atsushi Miyamoto , Hidetoshi Morokuma , Chie Shishido , Mitsuji Ikeda , Yasutaka Toyoda
- Applicant: Maki Tanaka , Atsushi Miyamoto , Hidetoshi Morokuma , Chie Shishido , Mitsuji Ikeda , Yasutaka Toyoda
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2004-184682 20040623
- Main IPC: H01J37/28
- IPC: H01J37/28 ; G01N23/00 ; G21K7/00 ; G06K9/00

Abstract:
The present invention relates to a method and apparatus for measuring a three-dimensional profile using a SEM, capable of accurately measuring the three-dimensional profile of even a flat surface or a nearly vertical surface based on the inclination angle dependence of the amount of secondary electron image signal detected by the SEM. Specifically, a tilt image obtaining unit obtains a tilt image (a tilt secondary electron image) I(2) of flat regions a and c1 on a pattern to be measured by using an electron beam incident on the pattern from an observation direction φ(2). Then, profile measuring units presume the slope (or surface inclination angle) at each point on the pattern based on the obtained tilt image and integrate successively each presumed slope value (or surface inclination angle value) to measure three-dimensional profiles S2a and S2c. This arrangement allows a three-dimensional profile to be accurately measured.
Public/Granted literature
- US20050285034A1 Method and apparatus for measuring three-dimensional shape of specimen by using SEM Public/Granted day:2005-12-29
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