Invention Grant
- Patent Title: Apparatus and method for measuring overlay by diffraction gratings
- Patent Title (中): 用衍射光栅测量覆盖层的装置和方法
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Application No.: US10858587Application Date: 2004-06-02
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Publication No.: US07230703B2Publication Date: 2007-06-12
- Inventor: Abdurrahman Sezginer , Robert Shinagawa , Hsu-Ting Huang
- Applicant: Abdurrahman Sezginer , Robert Shinagawa , Hsu-Ting Huang
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Stallman & Pollock LLP
- Main IPC: G01B11/00
- IPC: G01B11/00

Abstract:
A method for measuring overlay in a sample includes obtaining an image of an overlay target that includes a series of grating stacks each having an upper and lower grating, each grating stack having a unique offset between its upper and lower grating. The image is obtained with a set of illumination and collection optics where the numerical aperture of the collection optics is larger than the numerical aperture of the illumination optics and with the numerical apertures of the illumination and collection optics are selected so that the unit cells of gratings are not resolved, the grating stacks are resolved and they appear to have a uniform color within the image of the overlay target.
Public/Granted literature
- US20050012928A1 Apparatus and method for measuring overlay by diffraction gratings Public/Granted day:2005-01-20
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