发明授权
- 专利标题： Lithographic projection apparatus and reflector assembly for use therein
- 专利标题（中）： 平版印刷设备和用于其中的反射器组件
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申请号： US10647120申请日： 2003-08-25
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公开(公告)号： US07233009B2公开(公告)日： 2007-06-19
- 发明人: Frank Jeroen Pieter Schuurmans , Levinus Pieter Bakker
- 申请人： Frank Jeroen Pieter Schuurmans , Levinus Pieter Bakker
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP02078528 20020827
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic projection apparatus includes a grazing incidence collector. The grazing incidence collector is made up of several reflectors. In order to reduce the amount of heat on the collector, the reflectors are coated. The reflector at the exterior of the collector has an infrared radiating layer on the outside. The inner reflectors are coated with an EUV reflective layer on the outside.
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