公开(公告)号：US08129702B2

公开(公告)日：2012-03-06

申请号：US12771466

申请日：2010-04-30

申请人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21F1/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

摘要翻译： 辐射系统包括被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎片的污染屏障。 污染屏障包括多个薄片。 薄片的表面包括材料。 辐射系统还包括被配置成收集来自污染屏障的辐射的收集器。 收集器的光学表面包括与薄片表面的材料相同的材料。

公开(公告)号：US20100238311A1

公开(公告)日：2010-09-23

申请号：US12161187

申请日：2007-01-16

申请人： Aleksey Kolesnychenko ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Aleksey Kolesnychenko ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： H04N5/228

CPC分类号： G02B27/46 ,  G02B27/58 ,  G06E3/00

摘要： An imaging device for forming an image of a sample object includes an optical device and a processing unit. The optical device captures a Fourier spectrum of an object. The processing unit is arranged for processing the Fourier spectrum from the optical device and is adapted for determining the image of the sample object from the intensity of the Fourier spectrum of the sample object and the intensity of the Fourier spectrum of a combination of the sample object and a reference object.

摘要翻译： 用于形成样本物体的图像的成像装置包括光学装置和处理单元。 光学器件捕获对象的傅里叶谱。 处理单元被布置用于从光学装置处理傅立叶频谱，并且适于根据样本对象的傅立叶频谱的强度和样本对象的组合的傅里叶谱的强度来确定样本对象的图像 和参考对象。

公开(公告)号：US20090115980A1

公开(公告)日：2009-05-07

申请号：US12318291

申请日：2008-12-24

申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03B27/52 ,  G01J3/10 ,  G03B27/72

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

公开(公告)号：US07405825B2

公开(公告)日：2008-07-29

申请号：US10539540

申请日：2003-12-19

申请人： Frank Jeroen Pieter Schuurmans ,  Michael Cornelis Van Beek ,  Levinus Pieter Bakker ,  Wouter Harry Jacinth Rensen ,  Bernardus Hendrikus Wilhelmus Hendriks ,  Robert Frans Maria Hendriks ,  Thomas Steffen

发明人： Frank Jeroen Pieter Schuurmans ,  Michael Cornelis Van Beek ,  Levinus Pieter Bakker ,  Wouter Harry Jacinth Rensen ,  Bernardus Hendrikus Wilhelmus Hendriks ,  Robert Frans Maria Hendriks ,  Thomas Steffen

IPC分类号： G01J3/32 ,  G01J3/457 ,  G02B26/02

CPC分类号： G01J3/02 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/10 ,  G01J3/28 ,  G01J3/36 ,  G01N21/274 ,  G01N21/31 ,  G01N2021/3196 ,  G01N2201/129

摘要： The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detecting the weighed optical signal. The optical analysis system (20) may further comprise a dispersive element (2) for spectrally dispersing the optical signal, the multivariate optical element being arranged to receive the dispersed optical signal. The blood analysis system (40) comprises the optical analysis system (20) according to the invention.

摘要翻译： 用于确定光信号的主分量的幅度的光学分析系统（20）包括用于反射光信号并由此通过光谱称重功能称重光信号的多元光学元件（10） 9 P，9 N），用于检测加权的光信号。 光学分析系统（20）还可以包括用于光谱分散光学信号的色散元件（2），所述多元光学元件被布置成接收分散的光信号。 血液分析系统（40）包括根据本发明的光学分析系统（20）。

公开(公告)号：US07309869B2

公开(公告)日：2007-12-18

申请号：US11127312

申请日：2005-05-12

申请人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

发明人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

IPC分类号： G03B27/52

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

摘要翻译： 光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜 。 照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。 辐射源可以可操作地发射EUV波长范围内的辐射。

公开(公告)号：US07307263B2

公开(公告)日：2007-12-11

申请号：US10890404

申请日：2004-07-14

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Cornelis Petrus Andreas Maria Luijkx ,  Frank Jeroen Pieter Schuurmans

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Cornelis Petrus Andreas Maria Luijkx ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.

摘要翻译： 光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑 图案形成装置。 图案形成装置用于使经调节的辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。 污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。 陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。

公开(公告)号：US07247866B2

公开(公告)日：2007-07-24

申请号：US10743265

申请日：2003-12-23

申请人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21G5/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source is disclosed. The contamination barrier includes an inner ring, an outer ring, and a plurality of lamellas. The lamellas extend in a radial direction from a main axis, and each of the lamellas is positioned in a respective plane that include the main axis. At least one outer end of each of the lamellas is slidably connected to at least one of the inner and outer ring.

摘要翻译： 公开了一种通过来自辐射源的辐射并捕获来自辐射源的碎片的污染屏障。 污染屏障包括内环，外环和多个薄片。 薄片从主轴沿径向方向延伸，并且每个薄片位于包括主轴线的相应平面中。 每个薄片的至少一个外端可滑动地连接到内圈和外圈中的至少一个。

公开(公告)号：US07233009B2

公开(公告)日：2007-06-19

申请号：US10647120

申请日：2003-08-25

申请人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

发明人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

IPC分类号： G03F7/20

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70958

摘要： A lithographic projection apparatus includes a grazing incidence collector. The grazing incidence collector is made up of several reflectors. In order to reduce the amount of heat on the collector, the reflectors are coated. The reflector at the exterior of the collector has an infrared radiating layer on the outside. The inner reflectors are coated with an EUV reflective layer on the outside.

摘要翻译： 光刻投影装置包括掠入射收集器。 放射入射收集器由多个反射器组成。 为了减少收集器上的热量，反射器被涂覆。 收集器外部的反射器在外部具有红外辐射层。 内部反射器在外部涂有EUV反射层。

公开(公告)号：US20060138350A1

公开(公告)日：2006-06-29

申请号：US11022943

申请日：2004-12-28

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.

摘要翻译： 光刻设备包括用于产生辐射的源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化的辐射投影到基板的目标部分上的投影系统。 照明系统包括用于减轻随着辐射产生而释放的碎片颗粒的碎片减轻系统和用于收集辐射的光学系统。 碎片减缓系统被设置为直接蒸发碎片颗粒，或直接对碎屑颗粒进行充填，或直接从碎片颗粒或其任何组合产生等离子体，辐射沿着该路径从源传播到 光学系统。

公开(公告)号：US06838684B2

公开(公告)日：2005-01-04

申请号：US10644954

申请日：2003-08-21

申请人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

发明人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

IPC分类号： G03F7/20 ,  H01L21/027 ,  G21G5/00

CPC分类号： G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the EUV radiation can be transferred on debris present in the EUV beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced.