Water soluble negative tone photoresist

Invention Grant

US07235348B2 Water soluble negative tone photoresist 有权

Title translation: 水溶性负色光致抗蚀剂

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Patent Title: Water soluble negative tone photoresist
Patent Title (中): 水溶性负色光致抗蚀剂
Application No.: US10443359

Application Date: 2003-05-22
Publication No.: US07235348B2

Publication Date: 2007-06-26
Inventor: Bang-Chein Ho , Jian-Hong Chen , Yusuke Takano , Ping-Hung Lu
Applicant: Bang-Chein Ho , Jian-Hong Chen , Yusuke Takano , Ping-Hung Lu
Applicant Address: TW Hsinchu
Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
Current Assignee Address: TW Hsinchu
Agency: Thomas, Kayden, Horstemeyer & Risley
Main IPC: G03F7/26
IPC: G03F7/26

Abstract:

In accordance with the objectives of the invention a new water soluble negative photoresist is provided for packing-and-unpacking (PAU) processing steps.

Abstract(Chinese):

根据本发明的目的，提供了一种新的水溶性负性光致抗蚀剂用于包装和包装（PAU）处理步骤。

Public/Granted literature

US20040234897A1 Water soluble negative tone photoresist Public/Granted day:2004-11-25

Information query

Espacenet

IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/26	.感光材料的处理及其设备（G03F7/12至G03F7/24优先）