发明授权
- 专利标题： Exposure apparatus of an optical disk master, method of exposing an optical disk master, and wavefront fluctuation correction mechanism
- 专利标题（中）： 光盘主机的曝光装置，曝光光盘主机的方法以及波前波动校正机构
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申请号： US10975605申请日： 2004-10-28
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公开(公告)号： US07236434B2公开(公告)日： 2007-06-26
- 发明人: Masahiko Tsukuda , Shinya Abe , Morio Tomiyama , Shuji Sato , Eiichi Ito
- 申请人： Masahiko Tsukuda , Shinya Abe , Morio Tomiyama , Shuji Sato , Eiichi Ito
- 申请人地址： JP Osaka
- 专利权人： Matsushita Electric Industrial Co., Ltd.
- 当前专利权人： Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址： JP Osaka
- 代理机构： RatnerPrestia
- 优先权： JP2001-198153 20010629
- 主分类号： G11B7/26
- IPC分类号： G11B7/26 ; G11B7/135
摘要：
Apparatus and method for exposing an optical disk master having a laser source, a deflector for deflecting a recording laser beam based on the laser beam of the laser source and an objective lens for focusing the recording laser beam on an optical disk master, including a liquid crystal plate provided between the laser source and the deflector, a parallel flat plate provided between the deflector and the objective lens, a photodetector that detects reflected light from the parallel flat plate, and an adjusting device for adjusting a voltage applied to the liquid crystal plate based on information on wavefront fluctuation of the recording laser beam detected by the photodetector.
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