- 专利标题: Lithographic apparatus and device manufacturing method
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申请号: US11546394申请日: 2006-10-12
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公开(公告)号: US07239373B2公开(公告)日: 2007-07-03
- 发明人: Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans , Laurentius Catrinus Jorritsma
- 申请人: Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans , Laurentius Catrinus Jorritsma
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox, P.L.L.C.
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03B27/42 ; G03B27/52
摘要:
A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.
公开/授权文献
- US20070030470A1 Lithographic apparatus and device manufacturing method 公开/授权日:2007-02-08