发明授权
US07244949B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
有权
用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
- 专利标题： Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
- 专利标题（中）： 用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
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申请号： US11366533申请日： 2006-03-03
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公开(公告)号： US07244949B2公开(公告)日： 2007-07-17
- 发明人: Rainer Knippelmeyer , Oliver Kienzle
- 申请人： Rainer Knippelmeyer , Oliver Kienzle
- 申请人地址： DE IL
- 专利权人： Carl Zeiss SMT AG,Applied Materials Israel
- 当前专利权人： Carl Zeiss SMT AG,Applied Materials Israel
- 当前专利权人地址： DE IL
- 代理机构： Jones Day
- 优先权： WOPCT/US2004/029079 20040907
- 主分类号： G21K5/10
- IPC分类号： G21K5/10 ; G21K7/00 ; H01J37/28
摘要：
An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.
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