发明授权
- 专利标题: Exposure apparatus
- 专利标题(中): 曝光装置
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申请号: US11611386申请日: 2006-12-15
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公开(公告)号: US07245350B2公开(公告)日: 2007-07-17
- 发明人: Shinya Mochizuki , Takashi Kamono
- 申请人: Shinya Mochizuki , Takashi Kamono
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Canon U.S.A. Inc I.P. Div
- 优先权: JP2005-327568 20051111; JP2005-363449 20051216
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/52 ; G03B27/62
摘要:
An exposure apparatus includes a vacuum chamber, a load-lock chamber disposed between the vacuum chamber and outside the exposure apparatus, a reticle cassette configured to hold a reticle, a conveying unit configured to convey the reticle cassette between the vacuum chamber and the load-lock chamber, and an opening and closing unit configured to open and close the reticle cassette. The opening and closing unit is disposed within the vacuum chamber.
公开/授权文献
- US20070121092A1 EXPOSURE APPARATUS 公开/授权日:2007-05-31
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