发明授权
US07251012B2 Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris
有权
具有碎片减轻系统的光刻设备，用于产生具有碎片缓解系统的EUV辐射的源和用于减轻碎片的方法
- 专利标题： Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris
- 专利标题（中）： 具有碎片减轻系统的光刻设备，用于产生具有碎片缓解系统的EUV辐射的源和用于减轻碎片的方法
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申请号： US10748851申请日： 2003-12-31
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公开(公告)号： US07251012B2公开(公告)日： 2007-07-31
- 发明人: Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Vladimir Vitalevitch Ivanov , Johannes Hubertus Josephina Moors , Givi Georgievitch Zukavishvili , Abraham Veefkind
- 申请人： Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Vladimir Vitalevitch Ivanov , Johannes Hubertus Josephina Moors , Givi Georgievitch Zukavishvili , Abraham Veefkind
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/54
摘要：
A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.