发明授权
US07251029B2 Birefringence measurement apparatus, strain remover, polarimeter and exposure apparatus
有权
双折射测量装置,应变去除器,旋光仪和曝光装置
- 专利标题: Birefringence measurement apparatus, strain remover, polarimeter and exposure apparatus
- 专利标题(中): 双折射测量装置,应变去除器,旋光仪和曝光装置
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申请号: US10610986申请日: 2003-06-30
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公开(公告)号: US07251029B2公开(公告)日: 2007-07-31
- 发明人: Yasuhiro Kishikawa , Seiji Takeuchi
- 申请人: Yasuhiro Kishikawa , Seiji Takeuchi
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Morgan & Finnegan LLP
- 优先权: JP2002-191706 20020701; JP2002-380014 20021227
- 主分类号: G01J4/00
- IPC分类号: G01J4/00
摘要:
A birefringence measurement apparatus for calculating information of polarization of light emitted from an object to be measured includes a light source, a first polarization element for extracting a beam in a specific polarization direction from light emitted from the light source, a sample stage that holds an object to be measured, at least one beam splitting unit that splits the light emitted from the object into two beams having the same polarization as that of the light emitted from the object, at least two second polarization elements for extracting beams in a specific polarization direction of the light split by the beam splitting unit, at least two light-quantity detectors for detecting light quantity of beams that have transmitted through the second polarization element, and an operation part for operating a light quantity received by the light-quantity detectors.
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