发明授权
- 专利标题： Correlation of vent tile settings and rack temperatures
- 专利标题（中）： 排气瓦设置和机架温度的相关性
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申请号： US10960574申请日： 2004-10-08
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公开(公告)号： US07251547B2公开(公告)日： 2007-07-31
- 发明人: Cullen E. Bash , Chandrakant D. Patel , Ratnesh K. Sharma , Abdlmonem Beitelmal
- 申请人： Cullen E. Bash , Chandrakant D. Patel , Ratnesh K. Sharma , Abdlmonem Beitelmal
- 申请人地址： US TX Houston
- 专利权人： Hewlett-Packard Development Company, L.P.
- 当前专利权人： Hewlett-Packard Development Company, L.P.
- 当前专利权人地址： US TX Houston
- 代理商 Richard P. Lange
- 主分类号： G05B15/00
- IPC分类号： G05B15/00 ; F25D17/00 ; F25D17/04
摘要：
In a method for correlating vent tiles with racks based upon vent tile settings and rack inlet temperatures, the vent tiles are set to a first setting, the first vent tile settings are recorded and the temperatures at the inlets of the racks are detected at the first vent tile settings. One of the vent tiles is closed to obtain a second setting, the second vent tile settings are recorded and the temperatures at the inlets of the racks are detected at the second vent tile settings. In addition, the vent tiles and the racks are correlated based upon the settings of the vent tiles and the temperatures detected at the first vent tile settings and the second vent tile settings.
公开/授权文献
- US20060080001A1 Correlation of vent tile settings and rack temperatures 公开/授权日：2006-04-13
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