Invention Grant
- Patent Title: Detection of defects in patterned substrates
- Patent Title (中): 检测图案化基板中的缺陷
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Application No.: US11069491Application Date: 2005-02-28
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Publication No.: US07253645B2Publication Date: 2007-08-07
- Inventor: Christopher G. Talbot , Chiwoei Wayne Lo
- Applicant: Christopher G. Talbot , Chiwoei Wayne Lo
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Maureen Walstra
- Main IPC: G01R31/305
- IPC: G01R31/305 ; G01R31/02 ; G01N23/22

Abstract:
A method of detecting defects in a patterned substrate includes positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images of a region of the patterned substrate lying within the FOV by scanning the charged-particle beam over the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate.
Public/Granted literature
- US20050200841A1 Detection of defects in patterned substrates Public/Granted day:2005-09-15
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