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    Feature-based defect detection
    1.
    发明授权
    Feature-based defect detection 有权
    基于特征的缺陷检测

    公开(公告)号：US06539106B1

    公开(公告)日：2003-03-25

    申请号：US09227747

    申请日：1999-01-08

    Applicant: Harry S. Gallarda ,  Chiwoei Wayne Lo ,  Adam Rhoads ,  Christopher G. Talbot

    Inventor： Harry S. Gallarda ,  Chiwoei Wayne Lo ,  Adam Rhoads ,  Christopher G. Talbot

    IPC: G06K946

    CPC classification number: G06K9/033 ,  G01R31/307 ,  G06K9/6202 ,  G06K2209/19 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J2237/2594 ,  H01J2237/2817

    Abstract: Methods and apparatus are provided for inspecting a patterned substrate, comprising: preparing a reference image and a test image, extracting features from the reference image and extracting features from the test image, matching features of the reference image and features of the test image; and comparing features of the reference image and of the test image to identify defects. Embodiments include apparatus for inspecting patterned substrates, computer-readable media containing instructions for controlling a system having a processor for inspecting patterned substrates, and computer program products comprising a computer usable media having computer-readable program code embodied therein for controlling a system for inspecting patterned substrates. The images can be electron-beam voltage-contrast images.

    Abstract translation: 提供了用于检查图案化衬底的方法和装置，包括：准备参考图像和测试图像，从参考图像中提取特征并从测试图像中提取特征，匹配参考图像的特征和测试图像的特征; 并比较参考图像和测试图像的特征以识别缺陷。 实施例包括用于检查图案化衬底的装置，包含用于控制具有用于检查图案化衬底的处理器的系统的指令的计算机可读介质，以及包括其中包含有计算机可读程序代码的计算机可用介质的计算机可用介质，用于控制用于检查图案化衬底 底物。 图像可以是电子束电压对比图像。

    Method of detecting defects in patterned substrates
    2.
    发明授权
    Method of detecting defects in patterned substrates 有权
    检测图案化基板缺陷的方法

    公开(公告)号：US06252412B1

    公开(公告)日：2001-06-26

    申请号：US09226967

    申请日：1999-01-08

    Applicant: Christopher G. Talbot ,  Chiwoei Wayne Lo

    Inventor： Christopher G. Talbot ,  Chiwoei Wayne Lo

    IPC: G01R31302

    CPC classification number: H01J37/265 ,  G06T7/0004 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817

    Abstract: Defects in a patterned substrate are detected by positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle imaging system having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images over multiple subareas of the patterned substrate lying within the FOV by scanning a charged-particle beam over the patterned substrate while maintaining the charged-particle-beam optical column fixed relative to the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate. The use of a large- FOV imaging system with substantially uniform resolution over the FOV allows acquisition of images over a wide area of the patterned substrate without requiring mechanical stage moves, thereby reducing the time overhead associated with mechanical stage moves. Multiple columns can be ganged together to further improve throughput.

    Abstract translation: 通过相对于图案化衬底定位带电粒子束光学柱来检测图案化衬底中的缺陷，带电粒子成像系统具有在FOV上具有基本均匀分辨率的视场（FOV）; 操作带电粒子束光学柱以通过在图案化衬底上扫描带电粒子束，同时保持带电粒子束光学柱相对于图案化衬底固定而在位于FOV内的图案化衬底的多个子区域上获取图像 ; 以及将获取的图像与参考值进行比较，以识别图案化衬底中的缺陷。 使用FOV成像系统在FOV上具有基本上均匀的分辨率，允许在图案化基底的广泛区域上获取图像，而不需要机械阶段移动，从而减少与机械阶段移动相关的时间开销。 可以将多个列组合在一起以进一步提高吞吐量。

    Automatic focusing device with frequency weighted amplification
    3.
    发明授权
    Automatic focusing device with frequency weighted amplification 失效
    具有频率加权放大的自动聚焦装置

    公开(公告)号：US4510384A

    公开(公告)日：1985-04-09

    申请号：US408282

    申请日：1982-08-16

    Applicant: James B. Grimbleby ,  Christopher G. Talbot

    Inventor： James B. Grimbleby ,  Christopher G. Talbot

    IPC: G03B13/36 ,  G02B7/36 ,  G03B3/10 ,  G01J1/20

    CPC classification number: G03B3/10

    Abstract: An optical system is automatically focussed by deriving an electrical signal which has a frequency distribution corresponding to the spatial frequency distribution of an image received from a focussing lens; applying to the electrical signal an amplification which is greater at high frequencies than at low frequencies; and adjusting the optical system to maximize the amplified signal.

    Abstract translation: 光学系统通过导出具有与从聚焦透镜接收的图像的空间频率分布相对应的频率分布的电信号自动聚焦; 向电信号施加在高频比在低频时更大的放大; 并调整光学系统以使放大的信号最大化。

    Methods and apparatus for acquiring data from intermittently failing circuits
    5.
    发明授权
    Methods and apparatus for acquiring data from intermittently failing circuits 失效
    从间歇性故障电路获取数据的方法和装置

    公开(公告)号：US5144225A

    公开(公告)日：1992-09-01

    申请号：US737553

    申请日：1991-07-25

    Applicant: Christopher G. Talbot ,  Neil Richardson

    Inventor： Christopher G. Talbot ,  Neil Richardson

    IPC: G01R31/305

    CPC classification number: G01R31/305

    Abstract: Methods and apparatus are disclosed for conditional acquisition of potential measurements in integrated circuits, with the aid of electron-beam probes. The conditional acquisition enables display of waveform images which permit diagnosis of the causes and/or origins of failure in circuits which fail intermittently. Data is acquired in the normal manner on each pass through the test pattern. At the end of each test pattern execution a pass/fail signal from the tester exercising the circuit is used to reject or accept the acquired data. In this fashion, it is possible to accumulate only that data which carries information about the failure of interest and to reject data which does not. Over several test pattern repetitions it is possible to display only that data which shows the failure. Engineers are thus able to efficiently diagnose intermittent failures without the need to change device operating parameters. In one form of the invention, (a) initially a first buffer is defined as a "good-data" buffer and a second buffer is defined as a "temporary-data" buffer; (b) the circuit is probed during application of a test vector pattern to acquire data; (c) the acquired data is summed with stored data from the "good-data" buffer, and the sum is stored in the "temporary-data" buffer; (d) a determination is made whether circuit has failed to operate as expected in response to the pattern and, if the circuit has failed to operate as expected, the second buffer is redefined as a "good-data" buffer and the first buffer is re-defined as a "temporary-data" buffer; and (e) steps (b)-(d) are repeated, such that the data stored in the "good-data" buffer represents failing operation of the circuit.

    Abstract translation: 公开了借助于电子束探针在集成电路中对电位测量进行条件采集的方法和装置。 条件采集可以显示允许诊断间歇性故障的电路故障原因和/或故障起因的波形图像。 在通过测试图案的每次通过中以正常方式获取数据。 在每个测试模式结束时，执行来自运行电路的测试仪的通过/失败信号用于拒绝或接受所获取的数据。 以这种方式，只能累积携带关于感兴趣的失败的信息的数据，并且拒绝不存在的数据。 在几个测试模式重复中，可以仅显示显示故障的数据。 因此，工程师能够有效地诊断间歇性故障，而不需要改变设备操作参数。 在本发明的一种形式中，（a）最初将第一缓冲器定义为“良好数据”缓冲器，将第二缓冲器定义为“临时数据”缓冲器; （b）在应用测试矢量模式获取数据时探测电路; （c）将获取的数据与来自“好数据”缓冲器的存储数据相加，并将和存储在“临时数据”缓冲器中; （d）确定电路是否按照预期的方式响应于该模式而失败，并且如果电路未按预期操作失败，则将第二缓冲器重新定义为“良好数据”缓冲器，并且第一缓冲器 重新定义为“临时数据”缓冲区; 和（e）重复步骤（b） - （d），使得存储在“良好数据”缓冲器中的数据表示电路的故障操作。

    Detection of defects in patterned substrates
    6.
    发明授权
    Detection of defects in patterned substrates 失效
    检测图案化基板中的缺陷

    公开(公告)号：US07253645B2

    公开(公告)日：2007-08-07

    申请号：US11069491

    申请日：2005-02-28

    Applicant: Christopher G. Talbot ,  Chiwoei Wayne Lo

    Inventor： Christopher G. Talbot ,  Chiwoei Wayne Lo

    IPC: G01R31/305 ,  G01R31/02 ,  G01N23/22

    CPC classification number: H01J37/265 ,  G06T7/0004 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817

    Abstract: A method of detecting defects in a patterned substrate includes positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images of a region of the patterned substrate lying within the FOV by scanning the charged-particle beam over the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate.

    Abstract translation: 检测图案化衬底中的缺陷的方法包括相对于图案化衬底定位带电粒子束光学柱，具有在FOV上具有基本均匀分辨率的视场（FOV）的带电粒子束光学柱; 操作带电粒子束光学柱以通过在图案化衬底上扫描带电粒子束来获取位于FOV内的图案化衬底的区域的图像; 以及将获取的图像与参考值进行比较，以识别图案化衬底中的缺陷。

    Self-masking FIB milling
    7.
    发明授权
    Self-masking FIB milling 失效
    自屏蔽FIB铣削

    公开(公告)号：US5616921A

    公开(公告)日：1997-04-01

    申请号：US268790

    申请日：1994-06-30

    Applicant: Christopher G. Talbot ,  Douglas Masnaghetti ,  Hongyu Ximen

    Inventor： Christopher G. Talbot ,  Douglas Masnaghetti ,  Hongyu Ximen

    IPC: B23K15/02 ,  C23C14/04 ,  C23C14/22 ,  G01Q30/02 ,  H01J37/147 ,  H01J37/304 ,  H01J37/305 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01J37/30

    CPC classification number: H01J37/304 ,  B23K15/02 ,  C23C14/04 ,  C23C14/221 ,  H01J37/3056 ,  H01J2237/31732 ,  H01J2237/31742

    Abstract: Preferential etching during FIB milling can result in a rough, pitted surface and make IC probing/repair operations difficult. Preferential etching is compensated by acquiring a contrast image of the partially-milled sample, preparing mask image data from the contrast image, and controlling further FIB milling using the mask image data. For example, a window is to be milled in a top-layer power plane of an IC to expose a hidden layer. The window is partially milled. A FIB image is acquired and thresholded to produce mask image data. The mask image data distinguish areas where the power plane has been milled through from those where it has not been milled through. Milling is resumed using the mask image data to control effective FIB milling current. The mask image data are updated periodically as the window is milled.

    Abstract translation: FIB铣削时的优先蚀刻可能导致粗糙的凹坑表面，使IC探测/维修操作变得困难。 通过获取部分研磨的样品的对比度图像，从对比图像准备掩模图像数据以及使用掩模图像数据来控制进一步的FIB研磨来补偿优先蚀刻。 例如，要在IC的顶层电源平面中铣削窗口以暴露隐藏层。 窗户部分铣削。 获取FIB图像并将其阈值化以产生掩模图像数据。 掩模图像数据区分电力平面已经被研磨的区域与未被研磨过的那些区域。 使用掩模图像数据恢复铣削以控制有效的FIB铣削电流。 当窗口被铣削时，掩模图像数据被周期性地更新。

    Method of probing a net of an IC at an optimal probe-point
    8.
    发明授权
    Method of probing a net of an IC at an optimal probe-point 失效
    在最佳探针点探测IC网络的方法

    公开(公告)号：US5530372A

    公开(公告)日：1996-06-25

    申请号：US228027

    申请日：1994-04-15

    Applicant: William T. Lee ,  Ronny Soetarman ,  Christopher G. Talbot

    Inventor： William T. Lee ,  Ronny Soetarman ,  Christopher G. Talbot

    IPC: G01R31/26 ,  G01R31/28 ,  G01R31/302 ,  G01R31/303

    CPC classification number: G01R31/303 ,  G01R31/2886 ,  H01J2237/2594 ,  H01J2237/30416

    Abstract: Probe-point placement methods are described. A layout description, a netlist description and a cross-reference description of an IC are retrieved from storage. The data structures associate with each net name a list of polygons. Polygons of a selected net are broken into segments of a specified step size. Each segment is evaluated in accordance with a set of prober rules. Values produced by the prober rules are weighted and combined to obtain a prober score for each segment. The prober score indicates suitability of the corresponding net location for probing. If the best prober score indicates an optimal segment exists for probing, the coordinates of that segment are stored and used to direct a probe to the corresponding location of the IC. If the best prober score indicates no optimal segment exists for probing, each segment of the net is evaluated in accordance with a set of probe-point cutter rules. Values produced by the probe-point cutter rules are weighted and combined to obtain a cutter score for each segment. The cutter score indicates suitability of the corresponding net location for cutting a probe-point hole. A segment having the best cutter score is considered optimal for placing a probe point. The methods can be used, e.g., with electron-beam, focused-ion-beam and laser-beam systems, and with mechanical probe systems.

    Abstract translation: 描述探针点放置方法。 从存储器检索布局描述，网表描述和IC的交叉引用描述。 数据结构与每个网络名称相关联的多边形列表。 所选网络的多边形被分解成指定步长的段。 每个段都按照一组探测器规则进行评估。 由探测器规则产生的值被加权并组合以获得每个段的探测器得分。 探测器分数表示相应的净位置适用于探测。 如果最好的探针分数表示存在用于探测的最佳分段，则该段的坐标被存储并用于将探针引导到IC的对应位置。 如果最佳探测器分数表示探测不存在最佳分段，则根据一组探针切割器规则评估网络的每个分段。 由探针切割器规则产生的值被加权并组合以获得每个切片的切割分数。 切割分数表示用于切割探针孔的相应净位置的适用性。 具有最佳切割分数的片段被认为是放置探针点的最佳选择。 该方法可以用于例如电子束，聚焦离子束和激光束系统以及机械探针系统。

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