发明授权
- 专利标题: Electron beam inspection apparatus
- 专利标题(中): 电子束检查装置
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申请号: US11099688申请日: 2005-04-06
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公开(公告)号: US07256400B2公开(公告)日: 2007-08-14
- 发明人: Masakazu Takahashi , Satoru Yamaguchi , Masashi Sakamoto
- 申请人: Masakazu Takahashi , Satoru Yamaguchi , Masashi Sakamoto
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2004-114859 20040409
- 主分类号: H01J37/28
- IPC分类号: H01J37/28 ; G01N23/225
摘要:
An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of the moving time and the inspection time as well as by simply optimizing the covered distance. At the time of preparing a recipe to determine the inspection points and the order of inspection, the sequence of a series of inspection points sequentially inspected is changed to optimize the order of inspection. Not only the sequence which minimizes the covered distance is determined but also the order of inspection of the inspection points is optimized in accordance with the charged state, warping of the wafer, the delivery position and other situations.
公开/授权文献
- US20050234672A1 Electron beam inspection apparatus 公开/授权日:2005-10-20