摘要:
An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of the moving time and the inspection time as well as by simply optimizing the covered distance. At the time of preparing a recipe to determine the inspection points and the order of inspection, the sequence of a series of inspection points sequentially inspected is changed to optimize the order of inspection. Not only the sequence which minimizes the covered distance is determined but also the order of inspection of the inspection points is optimized in accordance with the charged state, warping of the wafer, the delivery position and other situations.
摘要:
An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of the moving time and the inspection time as well as by simply optimizing the covered distance. At the time of preparing a recipe to determine the inspection points and the order of inspection, the sequence of a series of inspection points sequentially inspected is changed to optimize the order of inspection. Not only the sequence which minimizes the covered distance is determined but also the order of inspection of the inspection points is optimized in accordance with the charged state, warping of the wafer, the delivery position and other situations.
摘要:
An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of the moving time and the inspection time as well as by simply optimizing the covered distance. At the time of preparing a recipe to determine the inspection points and the order of inspection, the sequence of a series of inspection points sequentially inspected is changed to optimize the order of inspection. Not only the sequence which minimizes the covered distance is determined but also the order of inspection of the inspection points is optimized in accordance with the charged state, warping of the wafer, the delivery position and other situations.
摘要:
An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of the moving time and the inspection time as well as by simply optimizing the covered distance. At the time of preparing a recipe to determine the inspection points and the order of inspection, the sequence of a series of inspection points sequentially inspected is changed to optimize the order of inspection. Not only the sequence which minimizes the covered distance is determined but also the order of inspection of the inspection points is optimized in accordance with the charged state, warping of the wafer, the delivery position and other situations.
摘要:
A relay device first uses latest authentication data to determine whether request-authentication data transmitted from a wireless communications device is valid. If the latest authentication data is used to determine that the request-authentication data is valid, the relay device carries out relayed communications with the wireless communications device. If the latest authentication data is used to determine that the request-authentication data is invalid, the relay device next uses a former authentication data to determine whether the request-authentication data is valid. If the former authentication data is used to determine that the request-authentication data is valid, the relay device provides the wireless communications device with the latest authentication data to update authentication data in the wireless communications device.
摘要:
A relay device first uses latest authentication data to determine whether request-authentication data transmitted from a wireless communications device is valid. If the latest authentication data is used to determine that the request-authentication data is valid, the relay device carries out relayed communications with the wireless communications device. If the latest authentication data is used to determine that the request-authentication data is invalid, the relay device next uses a former authentication data to determine whether the request-authentication data is valid. If the former authentication data is used to determine that the request-authentication data is valid, the relay device provides the wireless communications device with the latest authentication data to update authentication data in the wireless communications device.
摘要:
An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.
摘要:
An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.
摘要:
An object of the present invention is to provide an edge detection technique and equipment which are capable of stably detecting an edge by suppressing the influence of noise even in the case where the image is obtained by charged particle radiation equipment, such as a scanning electron microscope and has a low S/N ratio. More specifically, the present invention is to propose a technique and equipment which are configured to determine a peak position (edge) on the basis of the following two edge extraction techniques. That is, the present invention is to propose a technique and equipment wherein at least two peaks are formed by using, as edge detection techniques, for example, one peak detection technique having a relatively high sensitivity and the other peak detection technique which is relatively less susceptible to the influence of noise than the one peak detection technique, and wherein a position where the peaks coincide with each other is determined as a true peak position (edge position).
摘要:
A charged particle beam apparatus is provided which can prevent the accuracy of positional shift detection from being degraded owing to differences in picture quality, so that even when the state of a charged particle beam is changed at the time that optical conditions are changed or the optical axis changes with time, an auto adjustment of the optical axis can be realized easily and highly accurately. In the charged particle beam apparatus, evaluation or adjustment of focusing is conducted before the deflection condition of an alignment deflector for optical axis adjustment is changed or a table of focus adjustment amounts in correspondence with deflection conditions of the alignment deflector is provided, whereby when the deflection condition of the alignment deflector is changed, a focus adjustment is carried out in accordance with the table.