发明授权
- 专利标题： Lithographic projection apparatus and reflector assembly for use therein
- 专利标题（中）： 平版印刷设备和用于其中的反射器组件
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申请号： US11224084申请日： 2005-09-13
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公开(公告)号： US07256407B2公开(公告)日： 2007-08-14
- 发明人: Frank Jeroen Pieter Schuurmans , Levinus Pieter Bakker
- 申请人： Frank Jeroen Pieter Schuurmans , Levinus Pieter Bakker
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP02078528 20020827
- 主分类号： H01J37/00
- IPC分类号： H01J37/00 ; G21K5/00
摘要：
A lithographic projection apparatus includes reflector assembly, a foil trap, and a housing that is constructed and arranged to contain the reflector assembly and the foil trap. The reflector assembly is connected to the housing via a first wall, and the foil trap is connected to the housing via a second wall. The apparatus also includes a chamber between the foil trap and the reflector assembly. The chamber is defined by the housing, the first wall, and the second wall. The apparatus further includes a pump that is configured to create a vacuum in the chamber.
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