发明授权
- 专利标题: Notched compound semiconductor wafer
- 专利标题(中): 缺口化合物半导体晶片
-
申请号: US11268028申请日: 2005-11-07
-
公开(公告)号: US07256477B2公开(公告)日: 2007-08-14
- 发明人: Ryuichi Toba , Naoya Sunachi
- 申请人: Ryuichi Toba , Naoya Sunachi
- 申请人地址: JP
- 专利权人: Dowa Mining Co., Ltd.
- 当前专利权人: Dowa Mining Co., Ltd.
- 当前专利权人地址: JP
- 代理机构: Bachman & LaPointe
- 主分类号: H01L29/04
- IPC分类号: H01L29/04 ; H01L29/06 ; H01L31/036
摘要:
There is provided a notched compound semiconductor crystal having the same specification even if it is turned over. With respect to a compound semiconductor wafer produced by slicing a compound semiconductor crystal having a crystal plane of (100) plane, the crystal is sliced so as to be tilted from the (100) plane in a direction of [101] or [10-1] when a notch is formed in a direction of [010], or the crystal is sliced so as to be tilted from the (100) plane in a direction of [0-10] or [010] when a notch is formed in a direction of [001], or the crystal is sliced so as to be tilted from the (100) plane in a direction of [001] or [00-1] when a notch is formed in a direction of [0-10], or the crystal is sliced so as to be tilted from the (100) plane in a direction of [010] or [0-10] when a notch is formed in a direction of [00-1].
公开/授权文献
- US20060113558A1 Notched compound semiconductor wafer 公开/授权日:2006-06-01
信息查询
IPC分类: