发明授权
- 专利标题: Optical system for ultraviolet light
- 专利标题(中): 紫外线光学系统
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申请号: US11252598申请日: 2005-10-19
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公开(公告)号: US07256932B2公开(公告)日: 2007-08-14
- 发明人: Alexander Epple , Toralf Gruner , Wolfgang Singer
- 申请人: Alexander Epple , Toralf Gruner , Wolfgang Singer
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE Oberkochen
- 代理机构: Sughrue Mion, PLLC
- 主分类号: G02B13/14
- IPC分类号: G02B13/14 ; G02B1/06
摘要:
An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.
公开/授权文献
- US20060119750A1 Optical system for ultraviolet light 公开/授权日:2006-06-08
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