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    Projection exposure system
    4.
    发明授权
    Projection exposure system 有权
    投影曝光系统

    公开(公告)号：US06806942B2

    公开(公告)日：2004-10-19

    申请号：US10434952

    申请日：2003-05-08

    申请人： Karl-Heinz Schuster ,  Wilhelm Ulrich ,  Toralf Gruner ,  Daniel Kraehmer ,  Wolfgang Singer ,  Alexander Epple ,  Helmut Beierl ,  Reiner Garreis

    发明人： Karl-Heinz Schuster ,  Wilhelm Ulrich ,  Toralf Gruner ,  Daniel Kraehmer ,  Wolfgang Singer ,  Alexander Epple ,  Helmut Beierl ,  Reiner Garreis

    IPC分类号： G03B2754

    CPC分类号： G03F7/70241 ,  G02B13/143 ,  G02B13/24

    摘要： A projection exposure system is proposed which is positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width &dgr;&lgr; about a central working wavelength &lgr;, wherein a relative width &dgr;&lgr;/&lgr; of the wavelength band is larger than 0.002, in particular, larger than 0.005, for example, of the Hg-I-line. The projection exposure system is a so-called three-bulge system comprising three bulges having, as a whole, a positive refractive power and two waists having, as a whole, a negative refractive power. By applying suitable measures, in particular, by suitably selecting the material for the lenses forming the projection exposure system, the long-term stability of the system is increased.

    摘要翻译： 提出了一种投影曝光系统，其可定位在第一物体和第二物体之间，用于在具有围绕中心工作波长λ的宽度偏差的波长带的光的第二物体的区域内成像第一物体，其中相对宽度 波长带的偏差λ/λ大于0.002，特别是大于0.005，例如Hg-I线。 投影曝光系统是所谓的三凸起系统，其包括总体上具有正屈光力的三个凸起，以及整体上具有负屈光力的两个凸起。 通过适当的措施，特别是通过适当选择形成投影曝光系统的透镜的材料，可以提高系统的长期稳定性。

    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    5.
    发明申请
    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置投影目标

    公开(公告)号：US20080304033A1

    公开(公告)日：2008-12-11

    申请号：US12194229

    申请日：2008-08-19

    申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    IPC分类号： G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

    摘要翻译： 降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。 为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。 在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。 在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。 这确保几何光学的定律不适用于不发生全反射。

    Optical system for ultraviolet light
    6.
    发明申请
    Optical system for ultraviolet light 有权
    紫外线光学系统

    公开(公告)号：US20060119750A1

    公开(公告)日：2006-06-08

    申请号：US11252598

    申请日：2005-10-19

    申请人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

    发明人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

    IPC分类号： G02F1/1335

    CPC分类号： G02B17/0892 ,  G02B3/12 ,  G02B3/14 ,  G02B13/143 ,  G02B17/0812

    摘要： An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.

    摘要翻译： 波长λ<= 200nm的紫外光的光学系统可以特别设计为用于微光刻的反射折射投影物镜，具有多个光学元件，包括由合成石英玻璃制成的光学元件或透明于 波长λ<= 200nm。 至少两个光学元件用于形成至少一个液体透镜组，该液体透镜组包括第一限定光学元件，第二限定光学元件和液体透镜，该液体透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中 限定光学元件并且包含对波长λ<= 200nm的透明紫外光的液体。 这使得即使在难以校正色彩的系统的情况下也能够有效地校正色像差。

    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    7.
    发明申请
    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置投影目标

    公开(公告)号：US20110228246A1

    公开(公告)日：2011-09-22

    申请号：US13115741

    申请日：2011-05-25

    申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    IPC分类号： G03F7/207 ,  G02B3/12 ,  G02B17/08 ,  G03B27/70

    CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

    摘要翻译： 降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。 为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。 在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。 在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。 这确保几何光学的定律不适用于不发生全反射。

    Optical system for ultraviolet light
    8.
    发明授权
    Optical system for ultraviolet light 有权
    紫外线光学系统

    公开(公告)号：US07256932B2

    公开(公告)日：2007-08-14

    申请号：US11252598

    申请日：2005-10-19

    申请人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

    发明人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

    IPC分类号： G02B13/14 ,  G02B1/06

    CPC分类号： G02B17/0892 ,  G02B3/12 ,  G02B3/14 ,  G02B13/143 ,  G02B17/0812

    摘要： An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.

    摘要翻译： 波长λ<= 200nm的紫外光的光学系统可以特别设计为用于微光刻的反射折射投影物镜，具有多个光学元件，包括由合成石英玻璃制成的光学元件或透明于 波长λ<= 200nm。 至少两个光学元件用于形成至少一个液体透镜组，该液体透镜组包括第一限定光学元件，第二限定光学元件和液体透镜，该液体透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中 限定光学元件并且包含对波长λ<= 200nm的透明紫外光的液体。 这使得即使在难以校正色彩的系统的情况下也能够有效地校正色像差。