Invention Grant
- Patent Title: Method for the quantitative measurement of the pulse laser stability of synthetic fused silica glass
- Patent Title (中): 用于定量测量合成石英玻璃的脉冲激光稳定性的方法
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Application No.: US10887421Application Date: 2004-07-08
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Publication No.: US07271911B2Publication Date: 2007-09-18
- Inventor: Christian Muehlig , Wolfgang Triebel , Siegfried Kufert , Sylvia Bark-Zollmann , Ute Natura , Frank Coriand
- Applicant: Christian Muehlig , Wolfgang Triebel , Siegfried Kufert , Sylvia Bark-Zollmann , Ute Natura , Frank Coriand
- Applicant Address: DE Mainz
- Assignee: Schott Glas
- Current Assignee: Schott Glas
- Current Assignee Address: DE Mainz
- Agency: Jordan and Hamburg LLP
- Priority: DE10331589 20030709
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
The present invention refers to a method for the quantitative measurement of the pulse laser stability of synthetic fused silica, whereby this method avoids time-consuming and demanding measurements and saves material. First, the absorption of fused silica is measured for different energy densities, and a non-linear function α1(H) is determined on the basis of the measured values. Second, the fused silica is subject to radiation with a higher energy density up to the point at which a constant absorption value is achieved. In the following, the absorption of the fused silica is measured at different energy densities, and a non-linear function α2(H) is determined. The difference between the two non-linear functions indicates the increase of absorption that depends on the energy density.
Public/Granted literature
- US20050007595A1 Method for the quantitative measurement of the pulse laser stability of synthetic silica glass Public/Granted day:2005-01-13
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