发明授权
- 专利标题: Method and apparatus of locating the optimum peeling axis of a log and the maximum radius portion thereof with respect to the optimum peeling axis
- 专利标题(中): 定位原木的最佳剥离轴线和相对于最佳剥离轴线的最大半径部分的方法和装置
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申请号: US11372100申请日: 2006-03-10
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公开(公告)号: US07275571B1公开(公告)日: 2007-10-02
- 发明人: Kazuhito Mawatari
- 申请人: Kazuhito Mawatari
- 申请人地址: JP Obu-shi
- 专利权人: Meinan Machinery Works, Inc.
- 当前专利权人: Meinan Machinery Works, Inc.
- 当前专利权人地址: JP Obu-shi
- 代理机构: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP
- 主分类号: B23Q15/00
- IPC分类号: B23Q15/00 ; B23Q16/00 ; B27B1/00
摘要:
A method for locating an optimum peeling axis of a log and a maximum radius point on peripheral surface of the log with respect to the located optimum peeling axis and an apparatus for practicing the method are disclosed. A plurality of swingable members are provided, each member having a contact surface which is swingable in contact with the peripheral surface of the log thereby to follows the peripheral profile of the log while it is being rotated about its preliminary axis. Angular positions of the contact surfaces are measured with respect to a reference position at a number of angularly spaced positions of the log. On the basis of the measured angular positions of the contact surfaces, radial distances of the log from a plurality of predetermined locations on the optimum peeling axis to selected contact surfaces are computed for comparison such radial distances. The distance having the greatest value is regarded as the maximum radius point of the log.
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