发明授权
- 专利标题： Photosensitive composition and lithographic printing plate precursor using the same
- 专利标题（中）： 光敏组合物和使用其的平版印刷版前体
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申请号： US10947260申请日： 2004-09-23
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公开(公告)号： US07279266B2公开(公告)日： 2007-10-09
- 发明人: Hiromitsu Yanaka , Takahiro Goto
- 申请人： Hiromitsu Yanaka , Takahiro Goto
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion Pllc.
- 优先权： JPP.2003-331528 20030924
- 主分类号： G03C1/73
- IPC分类号： G03C1/73 ; G03F7/027 ; G03F7/029 ; G03F7/033 ; G03F7/09
摘要：
A photosensitive composition comprising: (A) a polymerizable compound represented by the following formula (I): A—{O—[(CH(—R1)CH(—R2))m—O]n—C(═O)—C(—R3)═CH2}p (I) wherein R1, R2and R3 each represents a hydrogen atom or a methyl group, A represents a polyhydric alcohol residue or a polyhydric phenol residue, m represents an integer of from 1 to 6, n represents an integer of from 1 to 20, and p represents an integer of from 1 to 6; (B) an infrared absorber; and (C) an onium salt.