发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US11094490申请日： 2005-03-31
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公开(公告)号： US07279690B2公开(公告)日： 2007-10-09
- 发明人: Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans , Givi Georgievitch Zukavishvili , Bastiaan Theodoor Wolschrijn , Marc Hubertus Lorenz Van Der Velden
- 申请人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans , Givi Georgievitch Zukavishvili , Bastiaan Theodoor Wolschrijn , Marc Hubertus Lorenz Van Der Velden
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： H05H3/00
- IPC分类号： H05H3/00
摘要：
A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.
公开/授权文献
- US20060219950A1 Lithographic apparatus and device manufacturing method 公开/授权日：2006-10-05
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