发明授权
- 专利标题: Silicon layer production method and solar cell production method
- 专利标题(中): 硅层生产方法和太阳能电池生产方法
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申请号: US10563115申请日: 2005-05-17
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公开(公告)号: US07282190B2公开(公告)日: 2007-10-16
- 发明人: Masaki Mizutani , Shoji Nishida , Katsumi Nakagawa
- 申请人: Masaki Mizutani , Shoji Nishida , Katsumi Nakagawa
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2004-156968 20040527
- 国际申请: PCT/JP2005/009305 WO 20050517
- 国际公布: WO2005/117079 WO 20051208
- 主分类号: C01B33/26
- IPC分类号: C01B33/26 ; C30B15/20
摘要:
A solar cell is produced by dipping a multicrystalline silicon substrate 28 in a solution 24 containing silicon, growing a silicon layer on the substrate 28 while decreasing with time the temperature drop rate of the solution during the dipping of the substrate in the solution, and forming a pn junction in the silicon layer. Thereby, there is provided a silicon layer production method that can form a thick layer while restraining the degree of roughness, whereby a low-cost, multicrystalline-silicon solar cell production method is provided that realizes both a large current and a high FF.
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