发明授权
- 专利标题: Pattern forming method and method of manufacturing ink jet recording head
- 专利标题(中): 图案形成方法和制造喷墨记录头的方法
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申请号: US11295553申请日: 2005-12-07
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公开(公告)号: US07282243B2公开(公告)日: 2007-10-16
- 发明人: Norio Ohkuma , Hikaru Ueda , Maki Hatta , Masaki Ohsumi , Takayuki Ono
- 申请人: Norio Ohkuma , Hikaru Ueda , Maki Hatta , Masaki Ohsumi , Takayuki Ono
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2004-356784 20041209
- 主分类号: C08F2/50
- IPC分类号: C08F2/50
摘要:
The present invention has as its object to provide a pattern forming method which, even if a pattern is formed by photolithography, can keep the edge of the opening portion of the pattern in a sharp state and yet, can make the wall surface of the recess of the pattern into a tapered shape, and a method of manufacturing an ink jet recording head to which the aforedescribed method is applied. The pattern forming method is a pattern forming method having the step of forming on a substrate a coat resin layer containing a photopolymerizable resin, the step of applying a solution containing a photopolymerization starting agent onto the coat resin layer, and forming the distribution of the density of the photopolymerization starting agent in the direction of film thickness of the coat resin layer, and the step of applying light from above the coat resin layer through a mask having a pattern depicted thereon, and the step of developing the coat resin layer to which the light has been applied to thereby make it into a coat resin layer having the pattern, and this method is applied to the manufacture of an ink jet recording head.
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