Invention Grant
US07283252B2 Measuring method and apparatus using interference, exposure method and apparatus using the same, and device fabrication method
失效
使用干涉的测量方法和装置，使用其的装置的曝光方法和装置以及装置制造方法
- Patent Title: Measuring method and apparatus using interference, exposure method and apparatus using the same, and device fabrication method
- Patent Title (中): 使用干涉的测量方法和装置，使用其的装置的曝光方法和装置以及装置制造方法
-
Application No.: US10996381Application Date: 2004-11-26
-
Publication No.: US07283252B2Publication Date: 2007-10-16
- Inventor: Seima Kato
- Applicant: Seima Kato
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2003-399216 20031128
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01B9/02
Abstract:
A measuring method for measuring an interference fringe includes the steps of generating a reference wave as a result of transmission through a slit or pinhole in a mask of a portion of light that has passed a target optical system, generating the interference fringe between the reference wave and a wave of another portion of light that has passed the target optical system and contains aberration information of the target optical system, determining whether contrast of the interference fringe is higher than a predetermined threshold, and exchanging the pinhole or the slit when the contrast is below the predetermined threshold.
Public/Granted literature
Information query
