发明授权
US07285842B2 Siloxane epoxy polymers as metal diffusion barriers to reduce electromigration
有权
硅氧烷环氧聚合物作为金属扩散阻隔层以减少电迁移
- 专利标题： Siloxane epoxy polymers as metal diffusion barriers to reduce electromigration
- 专利标题（中）： 硅氧烷环氧聚合物作为金属扩散阻隔层以减少电迁移
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申请号： US10832844申请日： 2004-04-27
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公开(公告)号： US07285842B2公开(公告)日： 2007-10-23
- 发明人: Pei-I Wang , Toh-Ming Lu , Shyam P. Murarka , Ramkrishna Ghoshal
- 申请人： Pei-I Wang , Toh-Ming Lu , Shyam P. Murarka , Ramkrishna Ghoshal
- 申请人地址： US NY Mechanicville US NY Troy
- 专利权人： Polyset Company, Inc.,Rensselaer Polytechnic Institute
- 当前专利权人： Polyset Company, Inc.,Rensselaer Polytechnic Institute
- 当前专利权人地址： US NY Mechanicville US NY Troy
- 代理机构： Heslin Rothenberg Farley & Mesiti P.C.
- 主分类号： H01L23/58
- IPC分类号： H01L23/58 ; H01L23/485
摘要：
Structures employing siloxane epoxy polymers as diffusion barriers adjacent conductive metal layers are disclosed. The siloxane epoxy polymers exhibit excellent adhesion to conductive metals, such as copper, and provide an increase in the electromigration lifetime of metal lines. In addition, the siloxane epoxy polymers have dielectric constants less then 3, and thus, provide improved performance over conventional diffusion barriers.
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