发明授权
- 专利标题: Method and its apparatus for inspecting a pattern
- 专利标题(中): 检查图案的方法及其装置
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申请号: US10914115申请日: 2004-08-10
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公开(公告)号: US07295305B2公开(公告)日: 2007-11-13
- 发明人: Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama
- 申请人: Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2003-325526 20030918
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
An apparatus for inspecting a defect, has a light source; a rotating diffuser plate for reducing coherence of light emitted from the light source after its light intensity was adjusted and its illumination range is formed; oscillating mirrors that variably change the beam whose coherence was reduced on a pupil, irradiates it onto a wafer, and forms an image thereof. An image sensor images the wafer by focusing reflected light from the wafer and detects an image signal; a camera observes the detected image; and an image processing unit detects a defect of a pattern formed on the wafer based on the detected image signal. Thus, conditions for illuminating the sample can be changed variably in an arbitrary and easy manner, and a more minute defect can be detected with high sensitivity by changing transmissivity and phase conditions of a pupil filter on the detection side.
公开/授权文献
- US20050062963A1 Method and its apparatus for inspecting a pattern 公开/授权日:2005-03-24
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