Invention Grant
- Patent Title: Vacuum-insulating system and method for generating a high-level vacuum
- Patent Title (中): 真空绝热系统和产生高级真空的方法
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Application No.: US10802064Application Date: 2004-03-16
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Publication No.: US07297055B2Publication Date: 2007-11-20
- Inventor: David R. Sar , Jerry D. Withrow
- Applicant: David R. Sar , Jerry D. Withrow
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Agency: Schwegman, Lundberg & Woessner, P.A.
- Main IPC: B01D8/00
- IPC: B01D8/00

Abstract:
A method of generating a high-level vacuum comprises evacuating a chamber having a substantially-pure gas therein to a medium-level vacuum, and freezing the residual gas to generate the high-level vacuum within the chamber. Impurities, such as atmospheric air, may be purged from the chamber by evacuating the chamber to a medium level vacuum (e.g., around 10−2 Torr) and subsequently filling the chamber with the gas. This purging process may be repeated multiple times to decrease the level of impurities in the gas filling the chamber. The substantially-pure gas may have an impurity-level of less than approximately 100 PPM and may comprise carbon-dioxide, although the scope of the invention is not limited in this respect. The medium level vacuum may range between approximately 1×10−2 Torr and 5×10−2 Torr allowing the use of a roughing pump, and the high-level vacuum may range between approximately 1×10−5 and 1×10−8 Torr.
Public/Granted literature
- US20050204752A1 Vacuum-insulating system and method for generating a high-level vacuum Public/Granted day:2005-09-22
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