发明授权
- 专利标题: Antireflection structure
- 专利标题(中): 防反射结构
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申请号: US10368494申请日: 2003-02-20
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公开(公告)号: US07297386B2公开(公告)日: 2007-11-20
- 发明人: Toshiyuki Suzuki , Arimichi Ito , Nobuhito Toyama
- 申请人: Toshiyuki Suzuki , Arimichi Ito , Nobuhito Toyama
- 申请人地址: JP Tokyo
- 专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2002-043110 20020220
- 主分类号: B32B3/26
- IPC分类号: B32B3/26 ; G02B1/11 ; G02B27/44
摘要:
An antireflection structure (10) comprises a base (1), and a finely roughened antireflection part (2) formed in a surface of the base (1). The finely roughened antireflection part (2) includes a plurality of projections and depressions defined by the projections. The projections are distributed such that PMAX≦λMIN, where PMAX is the biggest one of distances between tips (2t) of the adjacent projections and λMIN is the shortest one of wavelengths of visible light rays in a vacuum. The sectional area of each projection in a plane parallel to the surface of the base (1) increases continuously from the tip (2t) toward the bottom (2b) of the depression adjacent to the projection. The shape (2Mt) of a tip part (Mt) of each projection in a plane perpendicular to the surface of the base (1) is sharper than the shape (2Mb) of a bottom part (Mb) of each depression in the same plane vertical to the surface of the base (1).
公开/授权文献
- US20050074579A1 Antireflection structure 公开/授权日:2005-04-07
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