发明授权
US07298010B1 Radiation-hardened transistor and integrated circuit 有权
辐射硬化晶体管和集成电路

  • 专利标题: Radiation-hardened transistor and integrated circuit
  • 专利标题(中): 辐射硬化晶体管和集成电路
  • 申请号: US11358391
    申请日: 2006-02-21
  • 公开(公告)号: US07298010B1
    公开(公告)日: 2007-11-20
  • 发明人: Kwok K. Ma
  • 申请人: Kwok K. Ma
  • 申请人地址: US NM Albuquerque
  • 专利权人: Sandia Corporation
  • 当前专利权人: Sandia Corporation
  • 当前专利权人地址: US NM Albuquerque
  • 代理商 John P. Hohimer
  • 主分类号: H01L23/62
  • IPC分类号: H01L23/62
Radiation-hardened transistor and integrated circuit
摘要:
A composite transistor is disclosed for use in radiation hardening a CMOS IC formed on an SOI or bulk semiconductor substrate. The composite transistor has a circuit transistor and a blocking transistor connected in series with a common gate connection. A body terminal of the blocking transistor is connected only to a source terminal thereof, and to no other connection point. The blocking transistor acts to prevent a single-event transient (SET) occurring in the circuit transistor from being coupled outside the composite transistor. Similarly, when a SET occurs in the blocking transistor, the circuit transistor prevents the SET from being coupled outside the composite transistor. N-type and P-type composite transistors can be used for each and every transistor in the CMOS IC to radiation harden the IC, and can be used to form inverters and transmission gates which are the building blocks of CMOS ICs.
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