发明授权
- 专利标题: Through-wafer interconnects for photoimager and memory wafers
- 专利标题(中): 用于光刻机和存储晶圆的透晶片互连
-
申请号: US10932296申请日: 2004-09-02
-
公开(公告)号: US07300857B2公开(公告)日: 2007-11-27
- 发明人: Salman Akram , Charles Watkins , Mark Hiatt , David Hembree , James Wark , Warren Farnworth , Mark Tuttle , Sidney Rigg , Steven Oliver , Kyle Kirby , Alan Wood , Lu Velicky
- 申请人: Salman Akram , Charles Watkins , Mark Hiatt , David Hembree , James Wark , Warren Farnworth , Mark Tuttle , Sidney Rigg , Steven Oliver , Kyle Kirby , Alan Wood , Lu Velicky
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Perkins Coie LLP
- 主分类号: H01L21/441
- IPC分类号: H01L21/441
摘要:
A through-wafer interconnect for imager, memory and other integrated circuit applications is disclosed, thereby eliminating the need for wire bonding, making devices incorporating such interconnects stackable and enabling wafer level packaging for imager devices. Further, a smaller and more reliable die package is achieved and circuit parasitics (e.g., L and R) are reduced due to the reduced signal path lengths.
公开/授权文献
信息查询
IPC分类: