Methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices
    7.
    发明授权
    Methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices 有权
    确定包括集成电路的半导体衬底的x-y空间取向的方法,包括集成电路的半导体衬底的定位方法,半导体衬底的处理方法以及半导体器件

    公开(公告)号:US07955946B2

    公开(公告)日:2011-06-07

    申请号:US11439078

    申请日:2006-05-22

    IPC分类号: H01L21/76

    摘要: The invention includes methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices. In one implementation, a method of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit includes providing a semiconductor substrate comprising at least one integrated circuit die. The semiconductor substrate comprises a circuit side, a backside, and a plurality of conductive vias extending from the circuit side to the backside. The plurality of conductive vias on the semiconductor substrate backside is examined to determine location of portions of at least two of the plurality of conductive vias on the semiconductor substrate backside. From the determined location, x-y spatial orientation of the semiconductor substrate is determined. Other aspects and implementations are contemplated.

    摘要翻译: 本发明包括确定包括集成电路的半导体衬底的x-y空间取向的方法,包括集成电路的半导体衬底的定位方法,半导体衬底的处理方法和半导体器件。 在一个实现中,确定包括集成电路的半导体衬底的x-y空间取向的方法包括提供包括至少一个集成电路管芯的半导体衬底。 半导体衬底包括电路侧,背面以及从电路侧延伸到背面的多个导电通路。 检查半导体衬底背面上的多个导电通孔以确定半导体衬底背面上的多个导电通孔中的至少两个的部分的位置。 从确定的位置确定半导体衬底的x-y空间取向。 考虑了其他方面和实现。

    Methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices
    8.
    发明申请
    Methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices 有权
    确定包括集成电路的半导体衬底的x-y空间取向的方法,包括集成电路的半导体衬底的定位方法,半导体衬底的处理方法以及半导体器件

    公开(公告)号:US20070269994A1

    公开(公告)日:2007-11-22

    申请号:US11439078

    申请日:2006-05-22

    IPC分类号: H01L21/00

    摘要: The invention includes methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices. In one implementation, a method of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit includes providing a semiconductor substrate comprising at least one integrated circuit die. The semiconductor substrate comprises a circuit side, a backside, and a plurality of conductive vias extending from the circuit side to the backside. The plurality of conductive vias on the semiconductor substrate backside is examined to determine location of portions of at least two of the plurality of conductive vias on the semiconductor substrate backside. From the determined location, x-y spatial orientation of the semiconductor substrate is determined. Other aspects and implementations are contemplated.

    摘要翻译: 本发明包括确定包括集成电路的半导体衬底的x-y空间取向的方法,包括集成电路的半导体衬底的定位方法,半导体衬底的处理方法以及半导体器件。 在一个实现中,确定包括集成电路的半导体衬底的x-y空间取向的方法包括提供包括至少一个集成电路管芯的半导体衬底。 半导体衬底包括电路侧,背面以及从电路侧延伸到背面的多个导电通路。 检查半导体衬底背面上的多个导电通孔以确定半导体衬底背面上的多个导电通孔中的至少两个的部分的位置。 从确定的位置确定半导体衬底的x-y空间取向。 考虑了其他方面和实现。

    Methods of Determining X-Y Spatial Orientation of a Semiconductor Substrate Comprising an Integrated Circuit, Methods of Positioning a Semiconductor Substrate Comprising an Integrated Circuit, Methods of Processing a Semiconductor Substrate, and Semiconductor Devices
    9.
    发明申请
    Methods of Determining X-Y Spatial Orientation of a Semiconductor Substrate Comprising an Integrated Circuit, Methods of Positioning a Semiconductor Substrate Comprising an Integrated Circuit, Methods of Processing a Semiconductor Substrate, and Semiconductor Devices 有权
    确定包含集成电路的半导体衬底的X-Y空间取向的方法,包括集成电路的半导体衬底的定位方法,半导体衬底的处理方法和半导体器件

    公开(公告)号:US20110204526A1

    公开(公告)日:2011-08-25

    申请号:US13099672

    申请日:2011-05-03

    IPC分类号: H01L23/48

    摘要: The invention includes methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices. In one implementation, a method of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit includes providing a semiconductor substrate comprising at least one integrated circuit die. The semiconductor substrate comprises a circuit side, a backside, and a plurality of conductive vias extending from the circuit side to the backside. The plurality of conductive vias on the semiconductor substrate backside is examined to determine location of portions of at least two of the plurality of conductive vias on the semiconductor substrate backside. From the determined location, x-y spatial orientation of the semiconductor substrate is determined. Other aspects and implementations are contemplated.

    摘要翻译: 本发明包括确定包括集成电路的半导体衬底的x-y空间取向的方法,包括集成电路的半导体衬底的定位方法,半导体衬底的处理方法以及半导体器件。 在一个实现中,确定包括集成电路的半导体衬底的x-y空间取向的方法包括提供包括至少一个集成电路管芯的半导体衬底。 半导体衬底包括电路侧,背面以及从电路侧延伸到背面的多个导电通路。 检查半导体衬底背面上的多个导电通孔以确定半导体衬底背面上的多个导电通孔中的至少两个的部分的位置。 从确定的位置确定半导体衬底的x-y空间取向。 考虑了其他方面和实现。