Invention Grant
- Patent Title: Method and system for context-specific mask writing
- Patent Title (中): 用于上下文特定掩码写入的方法和系统
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Application No.: US11143361Application Date: 2005-06-01
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Publication No.: US07302672B2Publication Date: 2007-11-27
- Inventor: Robert C. Pack , Louis Scheffer
- Applicant: Robert C. Pack , Louis Scheffer
- Applicant Address: US CA San Jose
- Assignee: Cadence Design Systems, Inc.
- Current Assignee: Cadence Design Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Bingham McCutchen LLP
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
A method for generating lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.
Public/Granted literature
- US20050216877A1 Method and system for context-specific mask writing Public/Granted day:2005-09-29
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