Invention Grant
- Patent Title: Fugitive pattern for casting
- Patent Title (中): 逃逸模式铸造
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Application No.: US11260642Application Date: 2005-10-27
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Publication No.: US07302992B2Publication Date: 2007-12-04
- Inventor: Dane Chang , Yunwa W. Cheung , Charles F. Diehl , Joseph M. Vihtelic
- Applicant: Dane Chang , Yunwa W. Cheung , Charles F. Diehl , Joseph M. Vihtelic
- Applicant Address: US MI Whitehall US MI Midland
- Assignee: Howmet Research Corporation,Dow Global Technologies, Inc
- Current Assignee: Howmet Research Corporation,Dow Global Technologies, Inc
- Current Assignee Address: US MI Whitehall US MI Midland
- Main IPC: B22C7/00
- IPC: B22C7/00
Abstract:
A fugitive pattern for making a shell mold for investment casting a metal or alloy comprises a substantially random interpolymer and a low molecular weight polymer in proportions to provide a fugitive pattern having a combination of properties suitable for use in making the shell molds.
Public/Granted literature
- US20060063869A1 Fugitive pattern for casting Public/Granted day:2006-03-23
Information query
