发明授权
- 专利标题: Material supply system in semiconductor device manufacturing plant
- 专利标题(中): 半导体器件制造厂的材料供应系统
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申请号: US10507699申请日: 2003-03-27
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公开(公告)号: US07305275B2公开(公告)日: 2007-12-04
- 发明人: Kunihiro Miyazaki , Soichi Nadahara , Kinya Usuda , Masaji Akahori , Sota Nakagawa , Ken Nakajima
- 申请人: Kunihiro Miyazaki , Soichi Nadahara , Kinya Usuda , Masaji Akahori , Sota Nakagawa , Ken Nakajima
- 申请人地址: JP Tokyo
- 专利权人: Ebara Corporation
- 当前专利权人: Ebara Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2002-088153 20020327
- 国际申请: PCT/JP03/03874 WO 20030327
- 国际公布: WO03/081647 WO 20031002
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
In a small scaled plant intended for flexible manufacturing, a pure water supply system is provided at a low cost without reducing a production efficiency. A pure water system produces a plurality of grades of pure water which are supplied through pipes connected to points of use for cleaning, CMP, lithography, and the like. Upon receipt of a request signal from each point of use for starting to use a certain grade of pure water, a controller determines whether or not a required amount exceeds the capacity of the grade of pure water which can be supplied by the pure water system. If not, the controller sends a use permission signal to the point of use for permitting the same to use the pure water. When a certain use point is using the requested grade of pure water, the controller may not permit the requesting point of use to use the pure water until a use end signal is sent from the use point which is using the pure water.
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